Ticker : 300236.SZ
CN
Founded in July 1999, we have always adhered to taking technology as our strategic foundation, innovation as our growth engine, and industrial demands and cutting-edge technologies as our development orientation. We focus on the R&D, production, and application services of semiconductor functional chemical materials, and are committed to becoming a leading materials and technology service provider in the five core processes of integrated circuit manufacturing, namely electronic plating, electronic cleaning, electronic etching, electronic lithography and electronic polishing. More
0+
Employees
3
Facilities
0+
Clients
2.56
R&D
0+
Patents
* The above data is as of 2025.
Product
Plating & Additives

Plating & Additives

Copper interconnects are the "neural networks" of modern chips. Like microscopic wires, they are responsible for transmitting electrical signals between billions of transistors and serve as the lifeline of information flow. Their excellent electrical conductivity and low-power characteristics are the key to enabling chips to achieve high speed, high performance and small size.

More
Cleaning Solution

Cleaning Solution

Cleaning solutions are a series of key chemical reagents used to remove contaminants from the surface of wafers during the chip manufacturing process. Their purity, performance and stability directly determine the yield and reliability of semiconductor devices.

More
Etchant

Etchant

Etchant is a key material in the wet etching process of chips. With hydrofluoric acid, nitric acid and other substances as the main components, it achieves precision etching through redox reactions and is widely used in chip manufacturing.

More
Photoresist

Photoresist

Photoresist is the core photosensitive material of the lithography process. Through coating, exposure and development, it accurately transfers the circuit design on the photomask onto the wafer surface, forming a pattern barrier for subsequent etching or ion implantation.

More
CMP Slurry

CMP Slurry

Chemical Mechanical Polishing (CMP) planarizes silicon wafers or other substrate materials during processing using chemical etching and mechanical force. Integrated circuits generally adopt multi‑layer three‑dimensional wiring, requiring repeated cycles in front‑end manufacturing. CMP is a key process for wafer planarization and an important step in advancing process technology nodes.

More
Technology & R&D

We focus on national semiconductor needs and global cutting-edge IC materials.
We insist on independent R&D and innovation to achieve self-controlled high-end IC technologies.

We focus on national semiconductor needs and global cutting-edge IC materials. We insist on independent R&D and innovation to achieve self-controlled high-end IC technologies.

Milestones
2025
Headquarters Project Commenced

Overview of the 50,000-ton IC Key Process Materials Project, Headquarters & R&D Center in Songjiang, Shanghai

2024
Hefei Launch & Etching Tech Release

Phase I of 2nd Production Base in Hefei, Anhui successfully launched.

Company’s 5th core technology — Electronic Etching Technology officially released.

2023
Third Production Base Planned

Project Initiation & Planning of the Production Base in Shanghai Chemical Industry Park

2020
Project Initiation of Polishing Slurry

Initiated the R&D project of polishing slurry for wafer manufacturing, establishing the fourth core technology direction

2017
Layout of Photoresist

Initiated the R&D project of photoresist for wafer manufacturing, officially laying out the third core technology — photoresist

2013
Technology Iteration

The company developed its second-generation core technologies for electronic electroplating and electronic cleaning, with its technological strength continuously enhanced

2011
Listed on ChiNext

In June, the company was successfully listed on the ChiNext Board of the Shenzhen Stock Exchange (Stock Code: 300236)

2007
Songjiang Plant Completed

The company’s new plant in Songjiang was completed and put into operation, marking a new stage in production capacity and R&D capabilities.

2003
Core Technologies Initially Developed

The first-generation core technologies for electronic electroplating and electronic cleaning were developed, laying the foundation for a relatively complete technical system and product portfolio.

2001
First Production Base Established

The company acquired land and built a factory in Jiangqiao Town, Jiading District, Shanghai, owning its first proprietary production base.

2000
First Product Launched

The company’s first product—defalshing solution SYD712—was successfully launched onto the market, marking its official entry into the semiconductor packaging field.

1999
Sinyang Founded

In July, Shanghai Sinyang Chemical Co., Ltd. was established, kicking off its entrepreneurial journey.

News
More
Sustainable Development
Shanghai Sinyang has always adhered to a technology-led strategy, persisted in R&D and innovation-driven development, focused on meeting industrial demands, upheld the concept of sustainable development, and stayed committed to its mission of increasing benefits for customers, creating a fulfilling life for employees, providing impetus for the industry, and making contributions to society.
More