On August 26, 2025, the Shanghai Science and Technology Congress and Science and Technology Award Conference was held grandly, at which the winners of the 2024 Shanghai Science and Technology Awards were officially announced. The project "R&D and Industrialization of Dry Etching Cleaning Solution for Integrated Circuits", independently developed by Shanghai Sinyang Semiconductor Materials Co., Ltd., won the Second-Class Award of 2024 Shanghai Science and Technology Progress by virtue of its remarkable technological innovation and industrial application value. Among the 97 projects honored with the Science and Technology Progress Award this year, Shanghai Sinyang is the only semiconductor materials enterprise to receive the award as the first completing unit. This honor not only represents high recognition of the company’s R&D capabilities, but also injects new impetus into China’s rapidly developing semiconductor industry.

As one of the highest honors in Shanghai’s scientific and technological field, the Shanghai Science and Technology Progress Award has long been an annual highlight for the local scientific community. The award-winning projects represent the top level of Shanghai’s scientific and technological development; they not only generate tangible economic benefits for enterprises, but also effectively drive technological upgrading across the entire industry, playing a pivotal role in Shanghai’s efforts to build a globally influential science and technology innovation center.

The award-winning project was led by Dr. Wang Su, General Manager and Chief Engineer of Shanghai Sinyang. The R&D team went through years of arduous exploration, from project initiation and research to industrialization implementation. Every stage—from basic material research and construction of structure-activity relationships, to formula optimization and production process innovation—embodies the team’s wisdom and hard work. Eventually, the high-performance dry etching cleaning solution series achieved a breakthrough in R&D and large-scale mass production, and has yielded favorable market returns. This is the best reward for Shanghai Sinyang consistent commitment to independent innovation and its efforts to tackle key technological bottlenecks. The achievements of this project are not only a milestone in the company’s development, but also mark a major breakthrough in China’s semiconductor materials sector. They fully demonstrate that domestic enterprises have solid R&D and innovation capabilities in key semiconductor materials, and are capable of breaking foreign technological monopolies through independent R&D to realize localized substitution of critical materials.

Looking ahead, Shanghai Sinyang will continue to increase R&D investment, continuously optimize the performance of chip cleaning solution products, actively expand product application scenarios, and strive to become a leader in the semiconductor materials industry. With the continuous efforts of domestic enterprises such as Shanghai Sinyang, China’s semiconductor industry will surely forge ahead steadily on the path of independent innovation, gradually realizing the historic leap from "catching up" to "leading", and laying a solid foundation for the high-quality development of China’s science and technology industry.